MIDDLEFIELD, CT-The optical systems division of Zygo Corp. a global supplier of optical metrology instruments and high-precision optical systems, was awarded an order of more than $2 million in March by a major semiconductor manufacturer to produce Extreme UltraViolet (EUV) optics used in the development of advanced lithography processes.

This order is associated with the CSNE/SEMATECH consortium Micro Exposure Tool (MET-5) program that will help researchers achieve line widths of less than 16 nanometers in support of semiconductor roadmaps projected out to the year 2025.

Development and production is expected to take place throughout a 22-month period and will be carried out by Zygo's Extreme Precision Optics (EPO) operation in Richmond, CA.

"To be entrusted with this follow-on order for some of the finest EUV optics ever made is testimony to 20 years of accomplishment in this field," says Marc Tricard, executive director of business development at Zygo.