MIGDAL HAEMEK, Israel —Jordan Valley Semiconductors Ltd. announced that it has recently delivered and successfully commissioned its JVX7300L in-line X-ray metrology tool at multiple customers. The systems have been purchased for in-fab process development and automated production monitoring of GaN on Si wafers.
Isaac Mazor, Jordan Valley's CEO, said, "We are pleased to have been selected by key customers to provide in-line metrology for their GaN on Si manufacturing. We believe Jordan Valley is well positioned to support this and other emerging applications, with our comprehensive portfolio of X-ray based technologies and tools. These selections represent the customers' confidence in Jordan Valley's ability to provide innovative and robust solutions for their demanding process development and control needs."
Dr. Paul Ryan, Corporate VP and JV-UK manager noted, "GaN on Si technology presents new metrology challenges and requirements that only High-Resolution X-ray Diffraction (HRXRD) can adequately address. We have been supporting the manufacturing needs of both the compound and silicon semiconductor industries for many years. Bringing together these technologies Jordan Valley can provide solutions for the characterization of these advanced material systems, while meeting the customers' stringent process and automation requirements in a short period of development time. The JVX7300L provides the highest-level of automation, flexibility and robustness for such emerging applications. In choosing the JVX7300L platform, the customers' acknowledged the significant contribution of the product in shortening their process development cycle, together with the ability to use the same tool for production monitoring to help drive yield enhancement."
The JVX7300L is a production worthy X-ray metrology system for GaN on Si and other More-than-Moore applications and can be used for both in-fab process development and production monitoring. The tool supports a wide range of X-ray metrology modes to provide solutions for a wide range of materials and structures.
HRXRD is capable of measuring the composition, thickness strain/relaxation of single and multiple epilayer stacks. Additionally, with XRR and (GI -0.19%) XRD channels, the tool can also provide information on the thickness and density of a wide range of thin-films as well as providing unique microstructure information (crystallinity, grain-size and phase) of polycrystalline thin-films. Unlike optical or spectroscopic tools, HRXRD and XRR are first principle techniques that deliver accurate and precise results without calibration.
For more information, visit www.jordanvalley.com.
